Etching solution H-200A
Main component: Aqueous solution of ferric chloride
Etching solution that allows for easy etching of self-made circuit boards.
- Company：サンハヤト
- Price：Other
Etching solution - List of Manufacturers, Suppliers, Companies and Products
Etching solution Product List
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Etching solution H-1000A
Main component: Ferric chloride aqueous solution
Etching solution that allows for easy etching of self-made circuit boards.
- Company：サンハヤト
- Price：Other
Cu etching solution "Pure Etch C series"
We etch Cu and Cu alloy films effectively. We offer solutions for standard thin film etching and bulk etching of Cu/Ti stacked films.
The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. Keywords: wet etching, copper
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
Cr Etching Solution "Pure Etch CR series"
We will etch the Cr film well. If you are considering the formation of fine patterns, we also offer suggestions for pretreatment solutions to improve wettability.
The features of this product are as follows: - It has minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for etching of black matrix (BM) and photo masks made of chromium. Keywords: wet etching, chromium
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
Etching solution H-20L
Main component: Ferric chloride aqueous solution
Etching solution that allows for easy etching of self-made circuit boards.
- Company：サンハヤト
- Price：Other
W Etching Solution 'Pure Etch W Series'
We will etch the W film well.
The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are good. - There are no residues after etching. Keywords: Wet etching, tungsten
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
Au Etching Solution "Pure Etch AU series"
We will etch the Au film well. There are also etching solutions for seed layers that cause little damage to the Au plating and allow for etching of the Au seed layer.
The features of this product are as follows: - It allows for processing at low temperatures and in a short time. - The etching speed and in-plane uniformity of the etching shape are excellent. - It is suitable for fine bump formation and pattern formation processes. Keywords: wet etching, gold, plating, seed layer, selective etching solution.
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
TiW Etching Solution "Pure Etch TE Series"
We etch TiW films effectively. Since the etching performance varies depending on the film formation method and film structure, please contact us for more details.
The features of this product are as follows: - It forms a good positive taper. - There is minimal side etching, allowing for the formation of fine patterns. - The etching speed and in-plane uniformity of the etching shape are excellent. - There is no residue after etching. Keywords: wet etching, titanium tungsten
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
